发明名称 Heterojunction semiconductor device and method
摘要 A semiconductor device includes a first semiconductor substrate of a first band-gap material and a second semiconductor substrate of a second band-gap material. The second band-gap material has a lower band-gap than the first band-gap material. A heterojunction is formed between the first semiconductor substrate and the second semiconductor substrate substantially in a first plane. The semiconductor device further includes, in a cross-section which is perpendicular to the first plane, a first semiconductor region of a first conductivity type and a second semiconductor region of the first conductivity type both of which extend from the second semiconductor substrate at least partially into the first semiconductor substrate. The first and second semiconductor regions are spaced in the first semiconductor substrate from each other in a direction parallel to the first plane by a first distance which is arranged in an area proximate to the heterojunction and which is larger than a second distance which is arranged in an area distal to the heterojunction.
申请公布号 US8492771(B2) 申请公布日期 2013.07.23
申请号 US20070862661 申请日期 2007.09.27
申请人 RUEB MICHAEL;TREU MICHAEL;WILLMEROTH ARMIN;HIRLER FRANZ;INFINEON TECHNOLOGIES AUSTRIA AG 发明人 RUEB MICHAEL;TREU MICHAEL;WILLMEROTH ARMIN;HIRLER FRANZ
分类号 H01L29/15;H01L31/0312 主分类号 H01L29/15
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