发明名称 Vertical polysilicon-germanium heterojunction bipolar transistor
摘要 A vertical heterojunction bipolar transistor (HBT) includes doped polysilicon having a doping of a first conductivity type as a wide-gap-emitter with an energy bandgap of about 1.12 eV and doped single crystalline Ge having a doping of the second conductivity type as the base having the energy bandgap of about 0.66 eV. Doped single crystalline Ge having of doping of the first conductivity type is employed as the collector. Because the base and the collector include the same semiconductor material, i.e., Ge, having the same lattice constant, there is no lattice mismatch issue between the collector and the base. Further, because the emitter is polycrystalline and the base is single crystalline, there is no lattice mismatch issue between the base and the emitter.
申请公布号 US8492794(B2) 申请公布日期 2013.07.23
申请号 US201113048366 申请日期 2011.03.15
申请人 CAI JIN;CHAN KEVIN K.;HAENSCH WILFRIED E.;NING TAK H.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CAI JIN;CHAN KEVIN K.;HAENSCH WILFRIED E.;NING TAK H.
分类号 H01L29/66 主分类号 H01L29/66
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