| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a nano-fine structure capable of simplifying a manufacturing step because a vacuum step and a photolithography step are unnecessary.SOLUTION: A manufacturing method for a nano-fine structure comprises the steps of: preparing a substrate; forming a plurality of nano spheres on the substrate; forming an etched film between the substrate and each nano sphere; removing each nano sphere; forming a resist layer on the etched film; forming a plurality of bumps on a surface of the substrate by removing the etched film and a part of a substrate material under the etched film by performing wet etching; and exposing each bump by removing the resist layer. |
