发明名称 SCANNING TYPE PROJECTION EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problem that, in a scanning type projection exposure device for a large liquid crystal display panel, the device size has been increased to expand production, and energy entering an imaging system increases with the size increase of the device, resulting in further temperature distribution arising in air in an optical component or optical path in the imaging system, making a change in image performance due to the temperature distribution significant.SOLUTION: In the scanning type projection exposure device, the temperatures of a plurality of places in an imaging optical system are measured, and a change in image performance within a satisfactory image area is estimated from a temperature distribution. A performance change that arises due to the temperature distribution exhibits a distribution within a satisfactory image area. According to the distribution of the performance change, the shape of a slit is changed so as to illuminate only an area where a change in image performance can be corrected.
申请公布号 JP2013143561(A) 申请公布日期 2013.07.22
申请号 JP20120004600 申请日期 2012.01.13
申请人 CANON INC 发明人 YOSHIOKA HITOSHI;KAWANAMI KENTARO
分类号 H01L21/027;G02B17/08;G03F7/20 主分类号 H01L21/027
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