| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a photovoltaic device capable of preventing coating failures of a semiconductor layer caused by an unevenness shape of a texture structure to achieve excellent photoelectric conversion efficiency and manufacturing yield.SOLUTION: A method of manufacturing a photovoltaic device, for forming on a substrate a transparent conductive film, a semiconductor layer, and an electrode layer in this order, includes: a first step S10-S40 of measuring and evaluating an unevenness shape of a surface of the transparent conductive film after forming the transparent conductive film on the substrate; a second step S50 of determining a deposition condition of the semiconductor layer to be formed on the transparent conductive film on the basis of the evaluation result of the unevenness shape; and a third step S60-S110 of depositing the semiconductor layer on the transparent conductive film by the deposition condition determined at the second step. |
