发明名称 HIGHLY SENSITIVE OXIME ESTER PHOTOPOLYMERIZATION INITIATOR AND PHOTOPOLYMER COMPOSITION CONTAINING THE COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a photopolymerization initiator excellent in sensitivity and including an oxime ester structure.SOLUTION: There is provided an oxime ester compound having a carbazole group, useful as a photoinitiator in photo-crosslinking reaction, specifically, an oxime ester compound improved in solubility by substituting the ether or ester with the nitrogen group of a carbazole group. Such photoinitiator is useful for an LCD black resist, color resist, over coat, column spacer and organic insulation film and the like.
申请公布号 JP2013142087(A) 申请公布日期 2013.07.22
申请号 JP20120027521 申请日期 2012.02.10
申请人 HUNET PLUS CO LTD;TAKOMA TECHNOLOGY CO LTD 发明人 CHA HYUKJIN;RYU MISUN;PARK JIN KYU;JEON GIUNPYO
分类号 C07D209/86;C07C323/32;C07D333/22;C07D409/06;C08F2/50;G02B5/20;G03F7/004;G03F7/031 主分类号 C07D209/86
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