RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern.SOLUTION: There is provided a resist composition containing a base material component (A') which generates an acid upon exposure and whose solubility to a developing solution is changed by the action of an acid, wherein the base material component (A') contains a resin component (A'1) having a structural unit (a0) having a group represented by the formula (a0-0). There is provided a resist composition which contains a base material component (A) whose solubility to a developing solution is changed by the action of an acid and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) contains an acid generator (B1) composed of a compound represented by the formula (b1-1).