| 摘要 |
PROBLEM TO BE SOLVED: To provide a scan type projection exposure device configured so that the imaging performance of a projection optical system, especially the distortion and ass are not deteriorated in an exposure process.SOLUTION: In the projection optical system having an arc-like excellent image area outside an axis, aberration residual caused by the assembly error of a device, etc. and design value aberration remaining in the arbitrary shape of the projection optical system are combined to obtain deformation into an optimum slit shape. |
