RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COMPOUND

摘要

PURPOSE: A resist composition with improved preserving stability is provided to manufacture a negative type pattern suitable for producing a micro-pattern by using excellent lithography characteristics. CONSTITUTION: A resist composition comprises a substrate component (A) with changing solubility against a developer depending on acid functions, an acid compound component (J) with degraded acidity disassembled with exposure. The acid compound component (J) includes a compound indicated as the following chemical formula (J1). A manufacturing method of a resist pattern comprises the steps of: forming a resist film (2) by using the resist composition on a supporter (1), exposing the resist film and developing the resist film to make a resist pattern.