| 摘要 |
PURPOSE: A substrate deposition apparatus is provided to improve the deposition efficiency by regulating the distance between a target and magnets to change the intensity of a magnetic field. CONSTITUTION: A substrate deposition apparatus comprises a view port(170) and an optical sensor(180). The view port is coupled to one side of a chamber body(110) to allow for observation on the inside of the chamber body. The optical sensor comprises a light emitting unit(181) which emits light toward the view port to sense the existence of a substrate and a light receiving unit(182) which receives light reflected off a substrate, and the optical sensor is arranged on the other side of the chamber body opposite to the view port. The view port is formed with an irregular reflection pattern(172) for irregularly reflecting the light emitted from the light emitting unit so that the light is reflected off the view port, not delivered to the light receiving unit. |
