FePt SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

摘要

Provided are an FePt sputtering target with which it is possible to eliminate the use of multiple targets and use only a thin film comprising an FePt alloy that is suitable as a magnetic recording medium, and a method for producing the same. The FePt sputtering target comprises Fe, Pt and a metal oxide, as well as one or more metal elements other than Fe and Pt, in a dispersed structure of an FePt alloy phase, which is formed from at least 40 at% but less than 60 at% of Pt and Fe and more than 0 at% but 20 at% or less of one or more metal elements other than Fe and Pt such that the total of the Pt and the one or more metal elements is 60 at% or less, with Fe and inevitable impurities as the balance, and a metal oxide phase comprising inevitable impurities. The metal oxide content in terms of the entire target is 20 to 40 vol%.