发明名称 NONVOLATILE MEMORY DEVICE, OPERATION METHOD OF THE SAME AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory device, an operation method of the same and a manufacturing method of the same.SOLUTION: A nonvolatile memory device according to a present embodiment comprises: a plurality of channel structures formed on a substrate and each including a plurality of interlayer insulation layers and a plurality of channel layers, which are alternately stacked; first and second vertical gates alternately arranged between the channel structures along one direction crossing the channel structures and contacting the plurality of channel layers sandwiching memory films, respectively; and a pair of first and second word lines arranged above or under the channel structures and extending in the one direction so as to overlap a row of the first and second vertical gates arranged along the one direction. The first word line is connected with the first vertical gates and the second word line is connected with the second vertical gates.
申请公布号 JP2013140953(A) 申请公布日期 2013.07.18
申请号 JP20120265979 申请日期 2012.12.05
申请人 SK HYNIX INC 发明人 AHN YONG ZHU;CUI ZHONG WU;LU YOU HYUN
分类号 H01L21/8247;G11C16/02;G11C16/04;H01L21/336;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
代理机构 代理人
主权项
地址