发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE LAMINATE, FLEXIBLE CIRCUIT SUBSTRATE AND METHOD FOR FORMING PERMANENT PATTERN
摘要 <p>A photosensitive resin composition comprising: (A) a binder resin which comprises an acid-modified resin having ethylenic unsaturated groups; (B) a radical-polymerizable compound; (C) a thermal crosslinking agent; and (D) a photopolymerization initiator. The acid-modified resin bears, at at least one end of the backbone chain, a structure having an ability to inhibit radical polymerization.</p>
申请公布号 WO2013105410(A1) 申请公布日期 2013.07.18
申请号 WO2012JP83039 申请日期 2012.12.20
申请人 FUJIFILM CORPORATION 发明人 AIKI, YASUHIRO;KODAMA, KEISUKE;HIRONAKA, KOJI;ISOBE, HIDEMI;MATSUSHITA, YASUAKI
分类号 G03F7/027;C08F290/14;C08G18/67;C08G18/83;G03F7/004;H05K3/28 主分类号 G03F7/027
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