发明名称 CIRCUITS WITH LINEAR FINFET STRUCTURES
摘要 <p>A first transistor has source and drain regions within a first diffusion fin. The first diffusion fin projects from a surface of a substrate. The first diffusion fin extends lengthwise in a first direction from a first end to a second end of the first diffusion fin. A second transistor has source and drain regions within a second diffusion fin. The second diffusion fin projects from the surface of the substrate. The second diffusion fin extends lengthwise in the first direction from a first end to a second end of the second diffusion fin. The second diffusion fin is positioned next to and spaced apart from the first diffusion fin. Either the first end or the second end of the second diffusion fin is positioned in the first direction between the first end and the second end of the first diffusion fin.</p>
申请公布号 WO2013106799(A1) 申请公布日期 2013.07.18
申请号 WO2013US21345 申请日期 2013.01.13
申请人 TELA INNOVATIONS, INC.;BECKER, SCOTT, T.;SMAYLING, MICHAEL, C.;GANDHI, DHRUMIL;MALI, JIM;LAMBERT, CAROLE;QUANDT, JONATHAN, R.;FOX, DARYL 发明人 BECKER, SCOTT, T.;SMAYLING, MICHAEL, C.;GANDHI, DHRUMIL;MALI, JIM;LAMBERT, CAROLE;QUANDT, JONATHAN, R.;FOX, DARYL
分类号 H01L21/00 主分类号 H01L21/00
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