发明名称 |
THERMAL DIFFUSION APPARATUS |
摘要 |
PURPOSE: A heat diffusion device is provided to improve a property of a dopant layer by maintaining the gas evenly in a diffusion chamber. CONSTITUTION: A diffusion chamber contains a discharge pipe (29) in a side. The diffusion chamber contains a sub treatment member (10) inside. An injection pipe is equipped with one or more of holes (32). Gas needed for a thermal diffusion process is supplied The hole and a diffusion chamber.
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申请公布号 |
KR20130081942(A) |
申请公布日期 |
2013.07.18 |
申请号 |
KR20120003059 |
申请日期 |
2012.01.10 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
HA, JAE SOO;LIM, YOU BONG;JUN, JONG JIN |
分类号 |
H01L21/223;H01L21/20 |
主分类号 |
H01L21/223 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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