发明名称 THERMAL DIFFUSION APPARATUS
摘要 PURPOSE: A heat diffusion device is provided to improve a property of a dopant layer by maintaining the gas evenly in a diffusion chamber. CONSTITUTION: A diffusion chamber contains a discharge pipe (29) in a side. The diffusion chamber contains a sub treatment member (10) inside. An injection pipe is equipped with one or more of holes (32). Gas needed for a thermal diffusion process is supplied The hole and a diffusion chamber.
申请公布号 KR20130081942(A) 申请公布日期 2013.07.18
申请号 KR20120003059 申请日期 2012.01.10
申请人 LG ELECTRONICS INC. 发明人 HA, JAE SOO;LIM, YOU BONG;JUN, JONG JIN
分类号 H01L21/223;H01L21/20 主分类号 H01L21/223
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