发明名称 EXCIMER IRRADIATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an excimer irradiation apparatus that can be used in a wide wavelength range of a vacuum ultraviolet region, and can keep a reduced material cost even if a discharge vessel is sized up by suppressing the use of an expensive material.SOLUTION: An excimer irradiation apparatus 1 includes a discharge vessel 2, a plurality of light irradiation windows 9, a window side electrode layer 3, a back side electrode layer 4, a power supply device 5, and a discharge gas supply device 8. The discharge vessel 2 has an inlet 211 and an outlet 212 for a discharge gas, and has a plurality of openings 2B on a lower surface. The plurality of light irradiation windows 9 are formed of a material transparent to excimer light in the shape of a plate having about the same or larger area than those of the openings 2B, and are arranged so as to cover the plurality of openings 2B, respectively. The window side electrode layer 3 is arranged on an outer surface of each of the plurality of light irradiation windows 9 so as to transmit the excimer light. The back side electrode layer 4 is arranged on an outer surface of a back of the discharge vessel 2 opposite to the plurality of openings 2B. The power supply device 5 applies a high frequency voltage between the window side electrode layer 3 and the back side electrode layer 4. The discharge gas supply device 8 supplies the discharge gas from the inlet 211.
申请公布号 JP2013140912(A) 申请公布日期 2013.07.18
申请号 JP20120001071 申请日期 2012.01.06
申请人 TATSUMO KK;QUARK TECHNOLOGY CO LTD 发明人 NAKAMURA MASARU;HIROMOTO YOSHIYASU
分类号 H01L21/304;H01J65/00 主分类号 H01L21/304
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