| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of uniformly performing substrate processing.SOLUTION: The substrate processing apparatus 100 includes: a treatment tank 110 at which a substrate 200 is positioned; a transfer part 120 passing through the treatment tank 110 and transferring the substrate 200 in a fixed direction; and a plurality of pipes 130 including a plurality of nozzles 150 for jetting a treatment solution to the substrate 200 in various directions. |
