METHOD FOR PRODUCING SILICON-CONTAINING FILM AND METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE

摘要

This method for producing a silicon-containing film (1) comprises: a first step wherein the inside of a chamber (2) is dry cleaned with use of a fluorine-containing gas; a second step wherein a substrate (10) is brought into the chamber (2); a third step wherein the inside of the chamber (2) is purged with a silane-based gas, while having the substrate (10) held within the chamber (2); and a fourth step wherein a silicon-containing film (1) is formed on the substrate (10) after the third step.