发明名称 JIG FOR STATIC ELIMINATION AND SUBSTRATE PROCESSING DEVICE USING THE SAME, AND STATIC ELIMINATION METHOD FOR SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a jig for static elimination by which quick static elimination of respective members of a substrate processing device can be performed by a simple method, and to provide a static elimination method using the same.SOLUTION: A wafer J for static elimination can be transported by a transportation mechanism of a substrate processing device 1, has a substrate shape capable of being mounted in each processing module, and includes: an ion generation electrode 51 that is configured by a discharge electrode 501, a dielectric electrode 502, and a dielectric body 503 sandwiched between the discharge electrode 501 and the dielectric electrode 502; and a high-voltage power supply circuit 53a and a battery 53b applying a voltage to the discharge electrode 501 and the dielectric electrode 502. Static elimination of the respective members of the substrate processing device 1 is performed by ions generated from the ion generating electrode 51.
申请公布号 JP2013140775(A) 申请公布日期 2013.07.18
申请号 JP20120219207 申请日期 2012.10.01
申请人 TOKYO ELECTRON LTD 发明人 HAJIMA HITOSHI
分类号 H05F3/04;H01L21/02;H01T23/00 主分类号 H05F3/04
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