SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which smooths a surface of a pattern mask formed on a substrate, suppresses leakage of a solvent from a processing container to the outside and prevents deterioration of throughput.SOLUTION: A substrate processing apparatus comprises: a compartment mechanism for switching a transferring region for transferring a substrate between the outside of a processing container and the inside of a processing space and an adjacent region adjacent to the transferring region so as to switch a state that their atmospheres are interrupted and a state that their atmospheres are released; a solvent atmosphere supplying part for supplying the solvent atmosphere to the processing space in a state that each regions is released and for swelling a pattern mask of a substrate placed on a mounting part for processing; a substrate carrying-in opening for opening/closing to the transferring region in a state that each region is partitioned; and an air outlet for exhausting and removing the solvent atmosphere in the transferring region in the partitioned state. Thereby an exhaust volume is reduced to quickly carry-in/out the substrate.