PROCESSING DEVICE USING MULTICHARGED IONS

摘要

A material processing device that couples a spark discharge to a laser multicharged ion source to enhance the production of multicharged ions and increases ionization while simplifying structure. The processing device is capable of laser generation of multicharged ions for applications such as deposition and implantation. The ion beam of the device includes an electrostatic energy selector for controlling the energy of the ions used in processing. Some processing devices have the option to select ion charge over a wide range. The ability to select ions from a large spread of kinetic energy, and optionally with different charge states, offers a processing device with flexibility and applications in the areas of nanotechnology, microelectronics, and semiconductor processing.