发明名称 METHOD FOR FORMING ANTIFOULING FILM
摘要 <p>Provided is a method for forming an antifouling film which exhibits abrasion resistance sufficient for practical use. This film-forming method is a method for using a film-forming device (1) that has a pressure control means (vacuum pump (24), pressure detection means (22), controller (52)) which controls the pressure within a vacuum chamber (2), holding a plurality of substrates (101) to be subjected to film formation against a substrate holder (4a) in a manner such that the substrates (101) face deposition sources (34, 36), and then sequentially forming a supporting film and an antifouling film on each of the plurality of substrates (101) while rotating the substrate holder (4a), wherein the antifouling film is formed after adjusting the interior pressure of the vacuum chamber (2) by operating the pressure control means in a manner such that the interior pressure of the vacuum chamber (2) falls within a pressure range determined on the basis of the distance between the deposition source (36) and the substrate (101) held near the axis of rotation of the substrate holder (4a). It is preferable to adjust the interior pressure of the vacuum chamber (2) in a manner such that P satisfies the following relationship, when the distance between the substrate (101) and the deposition source (36) is set to SS (unit is mm), and the antifouling film formation pressure is set to P (unit is Pa): (0.06/SS)<=P<=(50/SS).</p>
申请公布号 WO2013105243(A1) 申请公布日期 2013.07.18
申请号 WO2012JP50444 申请日期 2012.01.12
申请人 SHINCRON CO., LTD.;MIYAUCHI, MITSUHIRO;SHIONO, ICHIRO;SAMORI, SHINGO;JIANG, YOUSONG;NAGAE, EKISHU 发明人 MIYAUCHI, MITSUHIRO;SHIONO, ICHIRO;SAMORI, SHINGO;JIANG, YOUSONG;NAGAE, EKISHU
分类号 C23C14/24;C23C14/12 主分类号 C23C14/24
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