发明名称 PROFILING SOLID STATE SAMPLES
摘要 Methods may operate to position a sample within a processing chamber and operate on a surface of the sample. Further activities may include creating a layer of reactive material in proximity with the surface, and exciting a portion of the layer of reactive material in proximity with the surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.
申请公布号 US2013180950(A1) 申请公布日期 2013.07.18
申请号 US201313784468 申请日期 2013.03.04
申请人 MICRON TECHNOLOGY, INC.;MICRON TECHNOLOGY, INC. 发明人 RUEGER NEAL R.;WILLIAMSON MARK J.;SANDHU GURTEJ S.;ARRINGTON JUSTIN R.
分类号 H01L31/0232 主分类号 H01L31/0232
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