| 摘要 |
PROBLEM TO BE SOLVED: To provide a silica glass crucible which can control oxygen concentration in a silicon melt to prevent crystal defects in the vicinity of wafer surfaces due to excessive dissolved oxygen in the silicon melt.SOLUTION: This silica glass crucible 12 has a straight barrel section 15 of nearly cylindrical shape extending in the vertical direction, a curved bottom section 16 and a corner section 17 connecting the straight barrel section and the bottom section smoothly. The crucible is provided with an inner surface 11 formed by arc melting using synthetic silica powder as a raw material, where the inner surface is plasma treated during or after the arc melting. |
