发明名称 BEAM LINE DESIGN TO REDUCE ENERGY CONTAMINATION
摘要 Methods and apparatus for reducing energy contamination can be provided to a beam line assembly for ion implantation. Protrusions comprising surface areas and grooves therebetween can face neutral trajectories within a line of sight view from the workpiece within the beam line assembly. The protrusions can alter the course of the neutral trajectories away from the workpiece or cause alternate trajectories for further impacting before hitting a workpiece, and thereby, further reduce energy contamination for more sensitive implants.
申请公布号 US2013181139(A1) 申请公布日期 2013.07.18
申请号 US201213348855 申请日期 2012.01.12
申请人 EISNER EDWARD C.;VANDERBERG BO H.;AXCELIS TECHNOLOGIES, INC. 发明人 EISNER EDWARD C.;VANDERBERG BO H.
分类号 G21K5/04;G21K1/10;G21K5/00 主分类号 G21K5/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利