METHOD AND SYSTEM OF PROVIDING DOPANT CONCENTRATION CONTROL IN DIFFERENT LAYERS OF A SEMICONDUCTOR DEVICE
摘要
A method and system for controlling the amount of a second material incorporated into a first material by controlling the amount of a third material which can interact with the second material.
申请公布号
WO2013106621(A1)
申请公布日期
2013.07.18
申请号
WO2013US21104
申请日期
2013.01.11
申请人
FIRST SOLAR, INC;XIONG, GANG;POWELL, RICK, C.;PENG, XILIN;BARDEN, JOHN;ALLENIC, ARNOLD;LIAO, FENG;RING, KENNETH, M.
发明人
XIONG, GANG;POWELL, RICK, C.;PENG, XILIN;BARDEN, JOHN;ALLENIC, ARNOLD;LIAO, FENG;RING, KENNETH, M.