发明名称 MANUFACTURING METHOD FOR AN ELECTRONIC SUBSTRATE
摘要 The manufacturing method for electronic substrate includes: forming an active region on a first face of a substrate; forming a first part of an interconnection pattern as a passive element on a second face of the substrate; forming an insulating layer as a stress-relieving layer on the second face of the substrate; and forming a second part of the interconnection pattern as the passive element on the insulating layer.
申请公布号 US2013181357(A1) 申请公布日期 2013.07.18
申请号 US201313787225 申请日期 2013.03.06
申请人 SEIKO EPSON CORPORATION;SEIKO EPSON CORPORATION 发明人 HASHIMOTO NOBUAKI
分类号 H01L23/48 主分类号 H01L23/48
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