发明名称 Semiconductor Device and Method of Forming an Inductor on Polymer Matrix Composite Substrate
摘要 A semiconductor device has a first insulating layer formed over a first surface of a polymer matrix composite substrate. A first conductive layer is formed over the first insulating layer. A second insulating layer is formed over the first insulating layer and first conductive layer. A second conductive layer is formed over the second insulating layer and first conductive layer. The second conductive layer is wound to exhibit inductive properties. A third conductive layer is formed between the first conductive layer and second conductive layer. A third insulating layer is formed over the second insulating layer and second conductive layer. A bump is formed over the second conductive layer. A fourth insulating layer can be formed over a second surface of the polymer matrix composite substrate. Alternatively, the fourth insulating layer can be formed over the first insulating layer prior to forming the first conductive layer.
申请公布号 US2013181323(A9) 申请公布日期 2013.07.18
申请号 US20100726880 申请日期 2010.03.18
申请人 LIN YAOJIAN;STATS CHIPPAC, LTD. 发明人 LIN YAOJIAN
分类号 H01L23/52;H01L21/768 主分类号 H01L23/52
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