发明名称 THERMALLY OXIDIZED HETEROGENEOUS COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING SAME
摘要 A thermally oxidized heterogeneous composite substrate provided with a single crystal silicon film on a handle substrate, said heterogeneous composite substrate being obtained by, prior to a thermal oxidization treatment at a temperature exceeding 850oC, conducting an intermediate heat treatment at 650-850oC and then conducting the thermal oxidization treatment at a temperature exceeding 850oC. According to the present invention, a thermally oxidized heterogeneous composite substrate with a reduced number of defects after thermal oxidization can be obtained.
申请公布号 WO2013105634(A1) 申请公布日期 2013.07.18
申请号 WO2013JP50387 申请日期 2013.01.11
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 AKIYAMA SHOJI;TOBISAKA YUJI;NAGATA KAZUTOSHI
分类号 H01L21/02;H01L21/324;H01L27/12 主分类号 H01L21/02
代理机构 代理人
主权项
地址