发明名称 |
THERMALLY OXIDIZED HETEROGENEOUS COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING SAME |
摘要 |
A thermally oxidized heterogeneous composite substrate provided with a single crystal silicon film on a handle substrate, said heterogeneous composite substrate being obtained by, prior to a thermal oxidization treatment at a temperature exceeding 850oC, conducting an intermediate heat treatment at 650-850oC and then conducting the thermal oxidization treatment at a temperature exceeding 850oC. According to the present invention, a thermally oxidized heterogeneous composite substrate with a reduced number of defects after thermal oxidization can be obtained. |
申请公布号 |
WO2013105634(A1) |
申请公布日期 |
2013.07.18 |
申请号 |
WO2013JP50387 |
申请日期 |
2013.01.11 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
AKIYAMA SHOJI;TOBISAKA YUJI;NAGATA KAZUTOSHI |
分类号 |
H01L21/02;H01L21/324;H01L27/12 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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