发明名称
摘要 PROBLEM TO BE SOLVED: To reduce the number of processes for fabricating a mesh in a blank for a mask and at the same time, cut a manufacturing cost. SOLUTION: This blank for a solid mask with a mesh comprises a metallic substrate 12 and the mesh 14 which is formed of a metal with different chemical etching characteristics from a metal forming the metallic substrate 12 and embedded in the metallic substrate 12. Further, a second layer 22 formed of a metal with different chemical etching characteristics from a metal constituting the first layer 21, is laminated on the first layer 21 constituting the metallic substrate 12, and thereby, a laminate 23 is formed. After that, a projecting part 23a is formed on the surface of the second layer side of the laminate 23 by plastically deforming the surface under pressure, and then is buffed to form the mesh 14 of the second layer 22. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP5236168(B2) 申请公布日期 2013.07.17
申请号 JP20060222426 申请日期 2006.08.17
申请人 发明人
分类号 B41N1/24;B41C1/14 主分类号 B41N1/24
代理机构 代理人
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