发明名称 METHOD OF GROWING NITRIDE SEMICONDUCTOR LAYER
摘要 <p>A method of growing a nitride semiconductor layer may include preparing a substrate in a reactor, growing a first nitride semiconductor on the substrate at a first temperature, the first nitride semiconductor having a thermal expansion coefficient different from a thermal expansion coefficient of the substrate, and removing the substrate at a second temperature.</p>
申请公布号 EP2615628(A1) 申请公布日期 2013.07.17
申请号 EP20130150658 申请日期 2013.01.09
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 LEE, MOON-SANG;PARK, SUNG-SOO;PARK, YOUNG-SOO
分类号 H01L21/20;H01L21/306 主分类号 H01L21/20
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