| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reflective mask capable of achieving high pattern transfer accuracy. <P>SOLUTION: The reflective mask includes a substrate, a multilayer film formed on one surface of the substrate, an intermediate layer formed on the multilayer film and an absorption layer formed on the intermediate layer. The absorption layer includes an absorber transfer pattern region having an absorber transfer pattern in which the absorption layer is partially removed. At least on a portion of the circumference of the absorber transfer pattern region, there is formed a light-shielding frame portion in which the substrate is exposed by the removal of the multilayer film, the intermediate layer, and the absorption layer. Only on the side face having the exposed multilayer film in the light-shielding frame portion, a protection oxide film having tolerance against cleaning by cleaning chemical is formed. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
