| 摘要 |
Provided is a mounting table structure on which a target object is mounted to perform a heat treatment on the target object in a processing chamber and which heats the mounted target object. Outermost peripheral feed lines are connected to a plurality of positions different in the circumferential direction of an outermost peripheral resistance heating heater for heating an outermost peripheral heating zone of a mounting table body, thereby dividing the outermost peripheral resistance heating heater into a plurality of heater sections. A heater control unit can individually control electrical states (for example, voltage application states, zero potential states, and floating states) of the respective outermost peripheral feed lines. The power supply state of each of the heater sections can be changed by a simple configuration. |
