| 摘要 |
The element (1) has a print pattern comprising a line grid structure (5) arranged in a layer (19) at a carrier (2). The grid structure has two line grids (7, 8) lying in the layer and intersect against each other, where the line grids code and conceal an image, respectively. An analyzer is arranged over the print pattern, and extends parallel to one of the line grids so that another line grid structure of the analyzer partially shades the line grid and the image within a preset view angle range is realized with better contrast as in plan on the print pattern. An independent claim is also included for a production method for a security element. |
