发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM, METHOD FOR FORMING THE INTERLAYER INSULATING FILM, AND DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in sensitivity and resolution, and an interlayer insulating film excellent in transparency, adhesion in development, relative permittivity, or the like, with reduced unevenness. SOLUTION: A radiation-sensitive resin composition contains a copolymer [A], a polymerizable unsaturated compound [B], radiation-sensitive polymerization initiator [C], and an organic solvent [D]. The copolymer [A] contains a structural unit (A1), a structural unit (A2), a structural unit (A3), and a structural unit (A4). In the copolymer [A], the structural unit (A1) has a content ratio of 1 mol% to 40 mol%, the structural unit (A2) has a content ratio of 1 mol% to 15 mol%, the structural unit (A3) has a content ratio of 1 mol% to 70 mol%, and the structural unit (A4) has a content ratio of 1 mol% to 30 mol%. COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 KR101287085(B1) 申请公布日期 2013.07.17
申请号 KR20110081196 申请日期 2011.08.16
申请人 发明人
分类号 G02F1/13;G03F7/004;G03F7/027 主分类号 G02F1/13
代理机构 代理人
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