Atomic layer deposition using metal amidinates,申请号EP20100150011-传众专利搜索

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发明名称	Atomic layer deposition using metal amidinates
摘要
申请公布号	EP2182088(B1)	申请公布日期	2013.07.17
申请号	EP20100150011	申请日期	2003.11.14
申请人	PRESIDENT AND FELLOWS OF HARVARD COLLEGE	发明人	GORDON, ROY G.;LIM, BOOYONG S.
分类号	C23C16/06;C07C237/00;C07F19/00;C23C16/18;C23C16/40;C23C16/44;C23C16/455	主分类号	C23C16/06
代理机构		代理人
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