发明名称 Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film
摘要 The present invention provides a positive-type radiation-sensitive composition containing (A) a siloxane polymer, and (B) a quinone diazide compound, in which the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole.
申请公布号 US8486604(B2) 申请公布日期 2013.07.16
申请号 US20100826049 申请日期 2010.06.29
申请人 HANAMURA MASAAKI;ICHINOHE DAIGO;TAKASE HIDEAKI;JSR CORPORATION 发明人 HANAMURA MASAAKI;ICHINOHE DAIGO;TAKASE HIDEAKI
分类号 G03F7/023;C08G77/18 主分类号 G03F7/023
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