发明名称 |
Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film |
摘要 |
The present invention provides a positive-type radiation-sensitive composition containing (A) a siloxane polymer, and (B) a quinone diazide compound, in which the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole.
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申请公布号 |
US8486604(B2) |
申请公布日期 |
2013.07.16 |
申请号 |
US20100826049 |
申请日期 |
2010.06.29 |
申请人 |
HANAMURA MASAAKI;ICHINOHE DAIGO;TAKASE HIDEAKI;JSR CORPORATION |
发明人 |
HANAMURA MASAAKI;ICHINOHE DAIGO;TAKASE HIDEAKI |
分类号 |
G03F7/023;C08G77/18 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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