| 摘要 |
A steam cleaning system for a substrate is provided to clean the substrate by spraying dry saturated steam particles which do not contain the liquefaction steam vapor. A steam cleaning process for a substrate is performed in a steam zone(200). An spraying member(210) sprays the steam to the substrate transferring toward the one direction horizontally within the steam zone. A steam supply unit(230) supplies the steam or a cleaning solution to the spraying member. A collecting member(220) collects the steam which is used for the cleaning in the stream zone. |
