| 发明名称 |
Siloxane removal via silicate formation for lifetime extension of photocatalytic devices |
| 摘要 |
A method of forming a photocatalyst device includes depositing a layer of UV photocatalyst and depositing islands of a sequestering agent on a surface of the layer of the UV photocatalyst.
|
| 申请公布号 |
US8486495(B2) |
申请公布日期 |
2013.07.16 |
| 申请号 |
US20100688264 |
申请日期 |
2010.01.15 |
| 申请人 |
SCHMIDT WAYDE R.;HUGENER-CAMPBELL TREESE;BHATIA TANIA;CARRIER CORPORATION |
发明人 |
SCHMIDT WAYDE R.;HUGENER-CAMPBELL TREESE;BHATIA TANIA |
| 分类号 |
B05D1/06;B05D3/06 |
主分类号 |
B05D1/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
