发明名称 SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY.
摘要 <p>A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.</p>
申请公布号 NL2010004(A) 申请公布日期 2013.07.16
申请号 NL20122010004 申请日期 2012.12.18
申请人 ASML NETHERLANDS B.V. 发明人 BRIZARD AURELIE;KOOLE ROELOF;PEETERS EMIEL
分类号 G03F7/20 主分类号 G03F7/20
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