| 摘要 |
A METHOD FOR FABRICATING A GLASS SUBSTRATE CONTAINING SiO? AS A MAIN INGREDIENT THEREOF AND HAVING A UNIFORM AND MINUTE PATTERN OF STRIPES FORMED ON THE SURFACE THEREOF BY ULTRAPRECISION POLISHING INCLUDES A STEP OF INSPECTING WHETHER OR NOT, AT THE TOPMOST SURFACE PORTION OF THE GLASS SUBSTRATE AFTER POLISHING, A GIVEN PROPERTY OF A BOUND ENERGY OF THE Si ATOM WITH RESPECT TO THE ELECTRONS OCCUPYING A 2P ORBIT AS DETERMINED BY XPS IS EQUAL TO OR LESS THAN A PREDETERMINED VALUE, AND THE GIVEN PROPERTY IS A SHIFT AMOUNT OF THE BOUND ENERGY OR A HALF-VALUE WIDTH OF THE BOUND ENERGY DISTRIBUTION, THE PREDETERMINED VALUE IS 0.10 EV OR 2.15 EV, RESPECTIVELY. |
