TRANSMITTANCE MEASUREMENT APPARATUS, TRANSMITTANCE INSPECTING APPARATUS OF PHOTOMASK, TRANSMITTANCE INSPECTING METHOD, PHOTOMASK MANUFACTURING METHOD, PATTERN TRANSFER METHOD, AND PHOTOMASK PRODUCT

摘要

PROBLEM TO BE SOLVED: To provide a transmittance measuring instrument capable of accurately measuring the film transmittance of a fine pattern (e.g., a fine light-semitransmitting film pattern formed on a transparent substrate). SOLUTION: In measuring the film transmittance of a fine pattern and the like of a light-semitransmitting film formed on a transparent substrate, light of a measurement wavelength is converged on the light-semitransmitting film to be a measurement object so as to be the smallest diameter (beam waist) and transmitted, and the whole transmitted light is subsequently collected in an integrating sphere and is detected by a detector. COPYRIGHT: (C)2012,JPO&INPIT