发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition being excellent in flatness after development, sensitivity, resolution, heat resistance, transparency, and the like; capable of reducing its electric power consumption, especially by realizing an organic insulation film having a low dielectric constant; capable of reducing crosstalk; and suitable for an organic insulation film in various display operations. SOLUTION: The photosensitive resin composition comprises: (a) an acrylic copolymer in which are copolymerized (i) a specific silsesquixane polyhedron oligomer-containing unsaturated compound, (ii) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, (iii) an epoxy group-containing unsaturated compound and (iv) an olefinic unsaturated compound; (b) a 1,2-quinone diazide compound; and (c) a solvent. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 KR101280478(B1) 申请公布日期 2013.07.15
申请号 KR20050101224 申请日期 2005.10.26
申请人 发明人
分类号 G03F7/022;G03F7/027;G03F7/039;G03F7/075 主分类号 G03F7/022
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