发明名称 DISPOSITIF DE PROJECTION HOMOTHETIQUE D'UN MOTIF A LA SURFACE D'UN ECHANTILLON, PROCEDE DE LITHOGRAPHIE UTILISANT UN TEL DISPOSITIF
摘要 <p>The invention relates to a device for homothetic projection of a pattern onto the surface of a sample (21) comprising a photosensitive zone. The device comprises means allowing a pattern to be projected onto the surface of the sample, and an optical system (12) allowing the size of the pattern projected onto the surface of the sample to be continuously controlled. The invention also relates to a photolithography method using such a projection device, and to a method and a kit for converting an optical microscope into such a projection device.</p>
申请公布号 FR2966941(B1) 申请公布日期 2013.07.12
申请号 FR20100058972 申请日期 2010.10.29
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 POLESEL JEROME
分类号 G03F7/20;B01J19/12;G02B21/36;G03F7/26 主分类号 G03F7/20
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