| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser annealing method and device that are capable of significantly reducing occurrence of irradiation stripes accompanying deterioration of beam uniformity at an irradiation surface caused by scattered light occurring at a lens surface.SOLUTION: In the case of a lens array type homogenizer optical system, laser irradiation is carried out while moving long-axis lens arrays 20a and 20b back and forth in a direction (X direction) corresponding to a long-axis direction of a linear beam. By doing so, an incident angle and intensity of laser light 1 incident on a large lens (long-axis condenser lens 22) constructing a long-axis light collecting optical system installed at a latter stage change from shot to shot, which significantly reduces a vertical stripe. Also, laser irradiation is carried out while moving short-axis lens arrays 26a and 26b back and forth in a direction (Y direction) corresponding to a short-axis direction of the linear beam. By doing so, the incident angle and the intensity of the laser light 1 that is incident on a large lens (projection lens 30) constructing a short-axis light collecting optical system installed at a latter stage change from shot to shot, which significantly reduces a horizontal stripe. |
