发明名称 METHOD OF FORMING A METAL PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE
摘要 A method of forming a metal pattern is provided. In the method, a first titanium layer, a copper layer and a second titanium layer are sequentially formed on a substrate. A photo pattern is formed on the second titanium layer. The first titanium layer, the copper layer and the second titanium layer are patterned using the photo pattern to form a first titanium pattern, a copper pattern formed on the first titanium pattern and a second titanium pattern formed on the copper pattern. Therefore, a fine metal pattern may be formed.
申请公布号 US2013178010(A1) 申请公布日期 2013.07.11
申请号 US201213585255 申请日期 2012.08.14
申请人 KIM BONG-KYUN;LEE WANG-WOO;CHOI SHIN IL;PARK HONG-SICK;PARK YOUNG-WOO 发明人 KIM BONG-KYUN;LEE WANG-WOO;CHOI SHIN IL;PARK HONG-SICK;PARK YOUNG-WOO
分类号 C23F1/14;B05D3/00;H01L33/08 主分类号 C23F1/14
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