SPUTTER GUN AND DEPOSITION APPARATUS USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a sputter gun which, while maintaining low pressure of atmospheric gas, stably generates good plasma, achieves a uniform gas supply flow to a sputter region, and provides good sputter deposition.SOLUTION: A sputter gun includes: a target holder 35 which stores a deposition sample; a cover cap 36 which is provided so as to cover the outer periphery of the target holder 35; spraying nozzles 50 which are positioned on the side of a substrate to be deposited of the cover cap and provided at predetermined intervals; gas piping parts (40 and 44) which supply the spraying nozzles 50 with sputter gas; and an electric circuit (32) for a plasma state which is used for changing the sputter gas introduced from the spraying nozzles 50 into a plasma state.