PHOTO MASK AND MANUFACTURING METHOD OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photo mask which reduces light diffraction during exposure and a manufacturing method of the same.SOLUTION: A high-frequency processing or primer processing is carried out in order to activate both sides of a transparent member 110. By activating both sides, adhesive strength between the transparent member 110 and first masks 121 and between the transparent member 110 and second masks 141 can be improved. The first masks 121 and the second masks 141 are selectively formed on both side of the transparent member 110 and block light selectively during exposure. Thereby, an electrode layer formed on a transparent substrate can be selectively formed by means of light selectively passing through the first masks 121 and the second masks 141.