| 摘要 |
PROBLEM TO BE SOLVED: To shorten a time required for freezing of a liquid film and reduce a cooling cost required for freezing of the liquid film.SOLUTION: In a substrate processing apparatus 1, a liquid film is formed on a top surface 91 of a substrate 9 by supplying pure water from a first liquid supplier 31 to the top surface 91 of the substrate 9, and rotating the substrate 9 by a substrate rotation mechanism 5. When the liquid film is formed, cooled pure water is supplied to a bottom surface 92 of the substrate 9 during rotation from a second liquid supplier 32 and the substrate 9 is cooled. Thereby rise of temperature of the substrate 9 and the liquid film at the formation of the liquid film, is suppressed. As a result, time required for freezing of the liquid film by a freezer 4 can be shortened. Even if temperature of cooling gas from the freezer 4 is raised, the liquid film can rapidly be freezed. Therefore heat insulation facilities such as a pipeline supplying the cooling gas from a cooling gas supplying source to a cooling gas nozzle 41, can be simplified. As a result, the cooling cost required for freezing the liquid film by the freezer 4 can be reduced. |
