A photoresist composition comprising a resin which is selected from the group consisting of (meth)acryl resins and poly(hydroxystylene) resins, a novolak resin, an acid generator, and a compound represented by formula (X1): and a solvent.
申请公布号
US2013177851(A1)
申请公布日期
2013.07.11
申请号
US201213714488
申请日期
2012.12.14
申请人
SUMITOMO CHEMICAL COMPANY, LIMITED;SUMITOMO CHEMICAL COMPANY, LIMITED
